- Business
- Lasertec Corporation (TSE:6920) develops, manufactures, sells, and services inspection and measurement equipment utilizing advanced optical and laser technologies, primarily for the semiconductor, flat panel display (FPD), and related high-tech industries. The company offers semiconductor-related products including photomask blank inspection systems and photomask inspection systems for extreme ultraviolet (EUV) and deep ultraviolet (DUV) lithography; wafer inspection and review systems for edge inspection, silicon carbide (SiC), gallium nitride (GaN), and film thickness measurement; FPD photomask inspection systems; laser microscopes such as confocal scanning laser microscopes for 3D observation and analysis; systems for lithium-ion batteries; and in-situ observation systems at ultra-high temperatures using confocal scanning laser microscopes; as well as electrochemical reaction visualizing confocal systems and coating thickness scanning systems. Lasertec operates globally with over 80% of sales from overseas markets, targeting leading semiconductor manufacturers and R&D organizations in Asia, North America, and Europe.
Founded in July 1960 as Tokyo ITV Laboratory and renamed Lasertec Corporation in 1986 (formerly NJS Corporation), the company is headquartered at 2-10-1 Shin-Yokohama, Kohoku-ku, Yokohama, Japan.
In recent developments, Lasertec launched the ACTIS A200 HiT Series actinic EUV patterned mask inspection system on October 31, 2025, featuring three times the throughput of the prior A150 model through optics and inspection enhancements, positioning it for potential adoption in TSMC's inline wafer fab processes and expanding the addressable market by approximately 70%. The company anticipates accelerated order growth in 2026 driven by increased customer inquiries amid global semiconductor demand. Lasertec also continues expanding its service business, targeting at least 20% of revenue from maintenance and support, while reporting fiscal 2024 revenue of 213.51 billion JPY, up 39.7% year-over-year.