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Shenzhen Newway Photomask Making Co., Ltd. Class A

Shenzhen Newway Photomask Making Co., Ltd. Class A

SSSE:688401
53.86
CNY
+0.96
(+1.81%)
1.44EPS
65.47P/E
18.56BMarket Cap
Oct 31Next Earn
Shenzhen Newway Photomask Making Co., Ltd. Class A
SSE:688401
(Shanghai Stock Exchange)

Recent

price

53.86

P/E

ratio

65.47

div

yld

1.41%

ROIC.AI

2013
2014
2015
2016
2017
2018
2019
2020
2021
2022
2023
2024
2025
TTM
CNY
6.62
3.07
2.33
2.23
1.87
1.22
1.74
2.9
3.38
3.95
3.48
4.54
6.01
6.65
Revenue per Share
0.26
0.32
0.26
0.39
0.21
0.06
-0.06
0.23
0.36
0.74
0.77
0.99
1.31
1.47
Basic EPS, GAAP
-0.4
0.13
0.47
0.1
-2.18
-2.93
-1.54
-0.27
-0.01
1.13
-0.89
0.07
0.46
- -
Free Cash Flow per Basic Share
0.53
0.12
0.14
0.12
0.11
0.06
0.21
0.2
0.18
0.15
0.23
0.33
0.36
0.76
Dividend per Share
0.24
0.72
1.23
2.7
2.84
2.95
4.39
2.83
3.19
6.95
7.56
7.2
8.59
8.95
Book Value per Share
0.23
0.71
1.23
2.7
2.84
2.95
4.29
2.78
3.1
6.87
7.49
7.13
8.44
8.8
Tangible Book Value per Share
12
32
41
47
57
119
125
138
146
162
193
193
192
192
Basic Weighted Avg Shares
76
99
95
105
107
145
218
402
494
640
672
876
1,155
1,280
Sales/Revenue/Turnover
13.32
19.94
17.37
18.9
13.5
8.2
-5.86
100
12.8
23.62
26.18
26.18
27.13
26.69
Operating Margin (%)
4
7
8
9
10
12
48
4
79
82
84
101
117
- -
Depreciation Expense
3
10
11
18
12
7
-8
32
52
120
149
191
252
282
Net Income, GAAP
40.17
27.92
12.81
10.09
11.97
- -
- -
146.57
30.04
15.72
13.5
11.79
11.55
9.67
Effective Tax Rate (%)
3.96
10.57
11.23
17.3
11.04
4.54
-3.56
8.08
10.6
18.72
22.13
21.8
21.81
22.03
Profit Margin (%)
-45
-21
10
85
82
-100
35
87
178
823
512
197
720
718
Working Capital
- -
- -
- -
- -
5
312
410
392
396
160
314
289
771
978
LT Debt
13
41
71
155
240
278
371
444
522
1,394
1,511
1,393
1,663
1,731
Total Equity
- -
13.09
10.21
10.32
4.48
- -
- -
-0.4
2.63
8.05
7.97
9.75
10.85
11.74
Return on Invested Capital (%)
- -
13.55
10.4
11.92
5.14
- -
- -
6.16
9.28
10.78
8.91
10.42
11.71
12.73
Return on Capital (%)
- -
38.53
19.15
16.16
7.43
3.97
-3.31
9.13
11.98
13.26
10.61
13.38
16.5
17.78
Return on Common Equity (%)

Capital Structure

CNY

•

in mil. unless spec.
Dec'25
Mar'26
Jun'26
ST Debt
244
193
70
LT Borrowings
769
851
976
LT Finance Leases
1
2
1
Preferred Equity and Hybrid Capital
- -
- -
- -
Shares Outstanding
193
193
193
Market Capitalization
9,437
9,288
18,558

Working Capital

CNY

•

in mil. unless spec.
Dec'25
Mar'26
Jun'26
Total Current Assets
1,332
1,335
1,271
Cash, Cash Equivalents & STI
701
763
656
Accounts Receivable, Net
266
314
314
Inventories
249
235
213
Total Current Liabilities
612
514
553
Payables & Accruals
- -
- -
- -
ST Debt
244
193
70
Deferred Revenue
- -
- -
- -

Growth Rates

CNY

•

in mil. unless spec.

(avg. rate of change)

10 years
5 years
1 year
Total Equity
44.79%
40.87%
19.37%
Free Cash Flow
-2,118.71%
-3,702.42%
605.02%
Net Income, GAAP
-47.03%
54.93%
32.02%
Sales/Revenue/Turnover
30.22%
23.95%
31.94%
Total Cash Common Dividend
42.37%
24.48%
10.22%

Quarterly Revenue

CNY

•

in mil. unless spec.

Year

Q1
Q2
Q3
Q4
FY
2024
177
219
207
273
876
2025
260
284
- -
328
1,155
2026
327
342
- -
- -
- -

Quarterly Earnings Per Share

CNY

•

in mil. unless spec.

Year

Q1
Q2
Q3
Q4
FY
2024
0.21
0.22
0.2
0.36
0.99
2025
0.26
0.3
- -
0.42
1.31
2026
0.35
0.4
- -
- -
- -

Quarterly Dividends Per Share

CNY

•

in mil. unless spec.

Year

Q1
Q2
Q3
Q4
FY
2024
- -
0.29
0.02
0.02
0.33
2025
0.02
0.32
- -
0.02
0.36
2026
0.01
0.41
- -
- -
- -
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Business
Shenzhen Newway Photomask Making Co., Ltd. is a China-based manufacturer specializing in the research, development, production, and distribution of high-precision photomasks for the flat panel display, semiconductor, touch control, and printed circuit board industries. Founded in 1997 and headquartered in Shenzhen, Guangdong Province, China, the company operates production bases and technical support facilities across Shenzhen, Chengdu, Suzhou, and Xiamen, serving display panel manufacturers, semiconductor wafer foundries, integrated circuit design houses, and packaging and testing enterprises globally. The company offers a comprehensive range of products and technical services, organized into several core categories: Flat Panel Display (FPD) Photomasks, covering all generation lines from G2.5 to G11 for TFT-LCD, AMOLED, LTPS, LTPO, Mini-LED, Micro-LED, and silicon-based OLED displays, as well as large-generation half-tone photomasks (HTM); Semiconductor Photomasks, designed for integrated circuit manufacturing, discrete power devices, MEMS sensors, CMOS image sensors (CIS), radio-frequency chips, and advanced packaging across mature and advanced process nodes; Touch Panel Photomasks, providing optical tooling for capacitive and resistive touch screen panels; Circuit Board Photomasks, offering high-density interconnect (HDI) and IC substrate photomask solutions; and Technical Support and Value-Added Services, including mask data conversion, precision optical defect inspection, laser defect repair, pellicle mounting, and photolithography process consulting. In recent developments, Shenzhen Newway Photomask Making Co., Ltd. has significantly expanded its high-generation display and semiconductor manufacturing capabilities. The company invested in a 2-billion-yuan high-generation, high-precision photomask manufacturing facility in Xiamen, focusing on G8.6 and below AMOLED, LTPO, and LTPS photomasks, achieving core equipment installation to initiate commercial production. In the semiconductor domain, the company reached commercial mass production and customer validation for 90nm full-set photomasks as well as 40nm and 28nm single-layer masks under Phase I of its dedicated semiconductor photomask project, while advancing the development and layout of Phase II targeting nodes down to 14nm. Additionally, the company strengthened its upstream supply chain integration through strategic partnerships and equity investments with advanced substrate and polishing material suppliers to accelerate raw material localization.