ShenZhen Longtu Photomask Co., Ltd.Class A
SSSE:68872130.70
CNY
-1.43
(-4.45%)
ISIN
CNE100006N40
Return %
Stock
S&P 500
1Y
-36.47
14.20
3Y
- -
81.12
5Y
- -
68.34
Capital Structure
CNY
•
in mil. unless spec.Working Capital
CNY
•
in mil. unless spec.Growth Rates
CNY
•
in mil. unless spec.Quarterly Revenue
CNY
•
in mil. unless spec.Quarterly Earnings Per Share
CNY
•
in mil. unless spec.Quarterly Dividends Per Share
CNY
•
in mil. unless spec.Company Description
- CEO
- Xiao Long Ye
- Full Time Employees
- 273
- Sector
- Electronic technology
- Industry
- Semiconductors
- Address
- Shenzhen China
- IPO Date
- Aug 6, 2024
- Website
- starmask.cn
- Similar Companies
- Business
- ShenZhen Longtu Photomask Co., Ltd. is a China-based independent semiconductor photomask manufacturer engaged in the research, development, design, production, and sale of high-precision photomasks and the provision of specialized mask technical services. Founded in 2010 and headquartered in Shenzhen, Guangdong Province, China, the company operates under the STARMASK brand and serves integrated circuit design firms, wafer foundries, and semiconductor packaging and testing enterprises across domestic and international markets. The company offers a comprehensive portfolio of photomask products and related engineering solutions, categorized primarily by substrate material and precision requirements: quartz photomasks fabricated from high-purity synthetic quartz glass featuring high optical transmittance, low thermal expansion, and high surface flatness for deep sub-micron process nodes; soda lime photomasks utilizing soda lime glass substrates for cost-efficient medium-to-low precision lithography applications; and value-added technical support services comprising integrated circuit mask data preparation, design rule checking, optical inspection, precision defect repair, specialized mask cleaning, and pellicle mounting and replacement. Its photomask products support process geometries ranging from 130 nanometers down to 65 nanometers, with production capabilities deployed for 40-nanometer and 28-nanometer process nodes. These products are utilized across specialized semiconductor fields, including power semiconductors such as MOSFETs and IGBTs, silicon carbide and gallium nitride wide-bandgap devices, MEMS sensors, analog integrated circuits, power management ICs, signal chain chips, optoelectronic devices, and advanced semiconductor packaging, serving downstream applications in automotive electronics, industrial automation, photovoltaic new energy systems, telecommunications, and consumer electronics. In recent developments, ShenZhen Longtu Photomask completed its initial public offering and listed its Class A shares on the Science and Technology Innovation Board (STAR Market) of the Shanghai Stock Exchange in August 2024 under the ticker 688721. To accelerate the scaling of high-end process nodes, the company advanced the construction of its High-End Semiconductor Chip Photomask Manufacturing Base through its wholly owned subsidiary, Zhuhai Longtu Photomask Technology Co., Ltd., which initiated pilot manufacturing in mid-2025 and commenced ramp-up of commercial volume production. Throughout 2025, the company executed capital increases totaling 400 million RMB into the Zhuhai subsidiary, increasing its registered capital to 600 million RMB to finance advanced lithography equipment procurement and cleanroom expansion. In 2026, the company initiated an additional equity financing plan to fund strategic research and production capabilities targeting advanced 40nm-to-28nm process nodes, strengthening its competitive positioning in independent third-party semiconductor photomask manufacturing.