- CEO
- Burkhardt Frick
- Full Time Employees
- 1,497
- Sector
- Producer manufacturing
- Industry
- Industrial machinery
- Address
- Schleissheimer Street 90 Garching BV Germany 85748
- IPO Date
- May 18, 1999
- Business
- SÜSS MicroTec SE SÜSS MicroTec SE engages in the development and manufacture of equipment and process solutions for microstructuring applications in the semiconductor industry and related markets including MEMS, microelectronics, and nanotechnology; its core products encompass photomask equipment for cleaning and processing, coaters and developers, inkjet printing systems, mask aligners, metrology tools, wafer bonders for temporary and permanent bonding including advanced packaging and micro electro-mechanical systems, UV projection scanners, and imprint lithography solutions. Founded in 1949 and headquartered in Garching bei München, Germany, the company maintains production facilities in Garching and Sternenfels, Germany, as well as Hsinchu and a new site in Zhubei, Taiwan; it operates sales subsidiaries and representatives across Europe, the Middle East, Africa, North America, Asia Pacific including China, Japan, Korea, Singapore, and Thailand, serving customers in automotive, medical, consumer electronics, and high-performance computing sectors. In recent developments, SÜSS MicroTec opened its new €15 million production facility in Zhubei, Taiwan in 2025, doubling cleanroom capacity to 6,300 square meters and supporting over 400 employees as its largest international infrastructure investment; the company raised its long-term guidance in 2025 targeting €750-900 million in sales by 2030 with 9-13% CAGR, gross margins of 43-45%, and EBIT margins of 20-22%, alongside updated 2025 forecasts for €470-510 million sales, 35-37% gross margins, and 11-13% EBIT; it previously divested its MicroOptics division to Focuslight Technologies in 2024 for €75.5 million to sharpen focus on core semiconductor equipment, while reporting H1 2025 sales growth of 38.2% to €266.4 million and planning 2026 launches of a mid-range photomask cleaner and next-generation UV scanner.