- CEO
- Yu Wen Liang
- Full Time Employees
- 10,751
- Sector
- Electronic technology
- Industry
- Semiconductors
- Address
- No. 266, Wenhua 2nd Road Taipei TP Taiwan 337021
- IPO Date
- Sep 17, 2001
- Business
- C Sun Mfg Ltd C Sun Mfg Ltd (2467.TW) manufactures and distributes semiconductor and electronic processing equipment, specializing in light and heat core technologies including plasma process, UV process, lamination and coating, thermal process, and wet process. The company offers printed circuit board (PCB) equipment such as roller coating systems, exposure systems, UV curing equipment, cut sheet laminators, conveyorized ovens, and convection cabinet ovens; flat panel display (FPD) equipment including thin film transistor liquid crystal display (TFT-LCD) equipment, TFT-liquid crystal module (LCM) equipment, and top UV machines; semiconductor and electronics equipment such as UV dryers, clean ovens, convection cabinet ovens, wafer vacuum laminate equipment, automated wafer-level bonding machines, plasma equipment, peelers, and laminators; as well as equipment for shoes, printing, painting, coating, photovoltaic (PV), textiles, plastics, rubber, chemicals, and aerospace industries, including industrial box and tunnel ovens, automatic system integration technologies, and consumables. C Sun Mfg Ltd serves industries including PCB, touch panel IC substrate, semiconductor advanced packaging, shoe making, printing, coating, and PV, with products distributed to over 20 countries such as Taiwan, China, Japan, United States, South Korea, Singapore, Malaysia, Vietnam, Thailand, and India. Founded on September 28, 1966 and headquartered in New Taipei City, Taiwan, with operating centers in Linkou, Taichung, Tainan, Guangzhou, Kunshan, Dongguan, and Bangkok, the company maintains a dominant market share in Greater China across bonding, laminating, peeling, baking, and electroplating pre-treatment equipment categories and continues to expand its global footprint through innovation in advanced processes like 3D stacking, heterogeneous integration, line-width scaling, and wafer thinning via the G2C+ Alliance.