- CEO
- Osamu Tsuji
- Full Time Employees
- 191
- Sector
- Electronic technology
- Industry
- Electronic production equipment
- Address
- 36 Waraya-cho Kyoto KY Japan 612-8443
- IPO Date
- May 30, 2001
- Business
- SAMCO Inc. (6387.T) manufactures semiconductor processing equipment specializing in thin-film deposition, etching, microfabrication, cleaning, and surface treatment systems for research and production applications in electronics, optoelectronics, MEMS, power devices, RF devices, quantum computing, and related fields. The company's core products include deposition systems such as plasma-enhanced chemical vapor deposition (PECVD), liquid source CVD (LSCVD), and atomic layer deposition (ALD) systems; etching systems comprising reactive ion etching (RIE), inductively coupled plasma (ICP) etching, silicon deep reactive ion etching (Si-DRIE), xenon difluoride (XeF2), and atomic layer etching (ALE) systems including the RIE-400iP-ALE; and surface treatment equipment such as Aqua Plasma cleaners, plasma cleaners, and UV ozone cleaners. Founded in 1979 and headquartered in Kyoto, Japan, SAMCO operates globally with offices in the United States, Europe (via subsidiary samco-ucp Ltd. in Liechtenstein), Korea, Taiwan, China, Singapore, Malaysia, India, and Australia, serving customers in over 35 countries. Recent developments include a strategic collaboration with Eastern Switzerland University of Applied Sciences (OST) announced in late 2023, providing RIE-10NR and UV-2 systems to OST's cleanroom for European market expansion in compound semiconductor research; the sale of Australia's first RIE-400iP-ALE system to the University of Adelaide in 2025 for III-V semiconductor and photonics advancement; the opening of a new Advanced Technology Development Center in Kyoto with a Class 1,000 cleanroom; and co-hosting Kyoto Day in New Delhi with TOWA Corporation ahead of SEMICON India 2025 to support India's semiconductor industry growth.